Low-energy model for ion implantation of arsenic and boron into (100) single-crystal silicon
- 著者名:
Obradovic,B.J. ( Univ.of Texas at Austin ) Morris,S.J. ( Univ.of Texas at Austin ) Morris,M.F. ( Univ.of Texas at Austin ) Tian,S. ( Univ.of Texas at Austin ) Wang,G. ( Univ.of Texas at Austin ) Beardmore,K. ( Los Alamos National Lab. ) Snell,C. ( Los Alamos National Lab. ) Jackson,J. ( Eaton Corp. ) Baummann,S. ( Evans Texas ) Tasch,A.F. ( Univ.of Texas at Austin ) - 掲載資料名:
- Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3212
- 発行年:
- 1997
- 開始ページ:
- 342
- 終了ページ:
- 353
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819426444 [081942644X]
- 言語:
- 英語
- 請求記号:
- P63600/3212
- 資料種別:
- 国際会議録
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