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Is SOI CMOS a promising technology for SOCs in high frequency range? Invited

著者名:
Raynaud, C.
Gianesello, F.
Tinella, C.
Flatresse, P.
Gwoziecki, R.
Touret, P.
Avenier, G.
Haendler, S.
Gonnard, O.
Gouget, G.
Labourey, G.
Pretet, J.
Marin, M.
Di Frenza, R.
Axelrad, D.
Delatte, P.
Provins, G.
Roux, J.
Balossier, E.
Vildeuil, J.C.
Boret, S.
Van Haaren, B.
Chevalier, P.
Boissonnet, L.
Schwartzmann, T.
Chantre, A.
Gloria, D.
De Foucauld, E.
Scheer, P.
Pavageau, C.
Dambrine, G.
さらに 26 件
掲載資料名:
Silicon-on-insulator technology and devices XII : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2005-03
発行年:
2005
開始ページ:
331
終了ページ:
344
総ページ数:
14
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774611 [1566774616]
言語:
英語
請求記号:
E23400/200503
資料種別:
国際会議録

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