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Silicon surface micromachining by anhydrous HF gas-phase etching with methanol

著者名:
Jang,W.I. ( Electronics and Telecommunications Research Institute (Korea) )
Choi,C.A. ( Electronics and Telecommunications Research Institute (Korea) )
Lee,C.S. ( Electronics and Telecommunications Research Institute (Korea) )
Hong,Y.S. ( Electronics and Telecommunications Research Institute (Korea) )
Lee,J.H. ( Electronics and Telecommunications Research Institute (Korea) )
Baek,J.T. ( Electronics and Telecommunications Research Institute (Korea) )
Kim,B.W. ( Electronics and Telecommunications Research Institute (Korea) )
さらに 2 件
掲載資料名:
Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3511
発行年:
1998
開始ページ:
143
終了ページ:
150
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429704 [0819429708]
言語:
英語
請求記号:
P63600/3511
資料種別:
国際会議録

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