1.

国際会議録
国際会議録
1. Depth-of-focus (DOF) and line-width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography
B. J. Lu ; Y. Huang ; H. T. Tseng ; C. C. Yu ; L. Meng ; M. Liao ; M. Legenza
出版情報: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6519
2.

国際会議録
国際会議録
2. Feasibility study of 45nm metal patterning with 0.93 NA
Y. F. Cheng ; Y. L. Chou ; Y. C. Hou ; B. J. Lu ; C. H. Yang
出版情報: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6520
3.

国際会議録
国際会議録
3. Line width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography
B. J. Lu ; E. T. Liu ; A. Zeng ; A. Tseng ; S. Wu
出版情報: Advances in resist materials and processing technology XXV.  2  pp.69233G-1-69233G-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6923