1.

国際会議録
国際会議録
1. Further Optimization of Plasma Nitridation of Ultra-thin Oxides for 65 nm 236 Node MOSFETs
Kraus, P.A. ; Chua, T.C. ; Rothschild, A. ; Cubaynes, F.N ; Veloso, A. ; Mertens, S. ; Date, L. ; Baue, T.M. ; Ahmed, K.Z. ; Campbell, J. ; Noun, F. ; Cruse, J. ; Schreutelkamp, R. ; Schaekers, M.
出版情報: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.236-243,  2004.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2004-01
2.

国際会議録
国際会議録
2. Laser Anneal Technology for Enhancement of Poly-Silicon Dopant Activation
Ma, Y. ; Ahmed, K.Z. ; Cunningham, K.L. ; Olsen, C.S. ; Leung, T.Y.B. ; Mcintosh, R.C. ; Mayur, A.J. ; Liang, H. ; Yam, M. ; Castle, M. ; Muthukrishnan, S. ; Liu, P.M. ; Foad, M. ; Miner, G.E. ; Higashi, G.S.
出版情報: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.230-235,  2004.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2004-01