1.

国際会議録
国際会議録
1. Layout-based manufacturability assessment and yield prediction methodology
Simon,P. ; Veelenturf,K. ; Adrichem,P.van ; Jong,J.de ; Sprij,S. ; Maly,W.P.
出版情報: In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.282-288,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3743
2.

国際会議録
国際会議録
2. New generation photomasks: 193-nm defect printability study
Karklin,L. ; Adrichem,P.van ; Driessen,F. ; Mazor,S.
出版情報: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.386-393,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4562