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Extending ArF to the 65-nm node with full-phase lithography

著者名:
Driessen, F.A. ( Numerical Technologies, Inc. (USA) )
Pierrat, C. ( Numerical Technologies, Inc. (USA) )
Vandenberghe, G. ( IMEC (Belgium) )
Ronse, K.G. ( IMEC (Belgium) )
Adrichem, P. ( Numerical Technologies, Inc. (USA) )
Liu, H.-Y. ( Numerical Technologies, Inc. (USA) )
さらに 1 件
掲載資料名:
Optical Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5040
発行年:
2003
巻:
Part Two
開始ページ:
1091
終了ページ:
1102
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
言語:
英語
請求記号:
P63600/5040
資料種別:
国際会議録

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