1.

国際会議録
国際会議録
1. High Temperature Corrosion Behavior of Si-Containing Alloys in the Gas Phase of Air-(Na2SO4+25.7mass%NaCl)
T. Sudiro ; T. Sano ; A. Yamauchi ; S. Kyo ; O. Ishibashi
出版情報: High-temperature oxidation and corrosion 2010 : selected, peer reviewed papers from the 3rd International Symposium on High-Temperature Oxidation and Corrosion 2010 (ISHOC-10), November 8-11, 2010, Zushi, Japan.  pp.272-277,  2011.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 696
2.

国際会議録
国際会議録
2. Oxidation Behavior of β-SiAlON in H2O-Containing Atmosphere
A. Yamauchi ; X.M. Yi ; T. Akiyama ; K. Kurokawa
出版情報: High-temperature oxidation and corrosion 2010 : selected, peer reviewed papers from the 3rd International Symposium on High-Temperature Oxidation and Corrosion 2010 (ISHOC-10), November 8-11, 2010, Zushi, Japan.  pp.395-399,  2011.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 696
3.

国際会議録
国際会議録
3. Failure Characteristics of Scales Formed on Si-Containing Low Carbon Steels during Cooling - Influences of Cooling Rate and Water Vapor
H. Nakata ; A. Yamauchi ; S. Taniguchi ; I.R. Sohn ; J.W. Choi
出版情報: High-temperature oxidation and corrosion 2010 : selected, peer reviewed papers from the 3rd International Symposium on High-Temperature Oxidation and Corrosion 2010 (ISHOC-10), November 8-11, 2010, Zushi, Japan.  pp.101-106,  2011.  Aedermannsdorf, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 696
4.

国際会議録
国際会議録
4. High Temperature Oxidation Behavior of MoSi2 under Low Pressure Atmosphere
A. Ibano ; K. Yoshimi ; A. Yamauchi ; R. Tu ; K. Maruyama ; K. Kurokawa ; T. Goto
出版情報: PRICM 6 : selected, peer reviewed papers from The sixth Pacific Rim International Conference on Advanced Materials and Processing, November 5-9, 2007, ICC Jeju, Jeju Island, Korea.  561-565  pp.427-430,  2007.  Uetikon-Zuerich.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 561-565
5.

国際会議録
国際会議録
5. Hybrid Bonding (Plasma activation and Anodic bonding) for Vacuum Sealing
A. Yamauchi ; J. Kagami ; H. Okada ; T. Suga
出版情報: Semiconductor Wafer Bonding 10: Science, Technology, and Applications.  pp.517-524,  2008.  Pennington, NJ.  Electrochemical Society
シリーズ名: ECS transactions
シリーズ巻号: 16(8)