Photomask and next-generation lithography mask technology XV. 1 pp.702811-1-702811-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
G. E. Bailey ; A. Tritchkov ; J. Park ; L. Hong ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; P. Xie ; J. Versluijs
出版情報:
Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering