1.

国際会議録
国際会議録
1. Real-time spatial control of photoresist development rate
A. Tay ; W. Ho ; N. Hu ; C. Kiew ; K. Tsai
出版情報: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6518
2.

国際会議録
国際会議録
2. Influence of wafer warpage on photoresist film thickness and extinction coefficient measurements
X. Wu ; A. Tay
出版情報: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6518
3.

国際会議録
国際会議録
3. A heater plate assisted integrated bake/chill system for photoresist processing
H. Chua ; A. Tay ; Y. Wang ; X. Wu
出版情報: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6519
4.

国際会議録
国際会議録
4. CD uniformity control via real-time control of photoresist properties
M. Chen ; J. Fu ; W. K. Ho ; A. Tay
出版情報: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220Y-1-69220Y-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6922
5.

国際会議録
国際会議録
5. In-situ real-time temperature control of baking systems in lithography
Y. Wang ; H.-T. Chua ; A. Tay
出版情報: Metrology, inspection, and process control for microlithography XXII.  2  pp.692237-1-692237-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6922
6.

国際会議録
国際会議録
6. Device performance-based OPC for optimal circuit performance and mask cost reduction
S.-H. Teh ; C.-H. Heng ; A. Tay
出版情報: Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA.  pp.692511-1-692511-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6925