1.

国際会議録
国際会議録
1. Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node
A. Nackaerts ; S. Verhaegen ; M. Dusa ; H. Kattouw ; F. van Bilsen ; S. Biesemans ; G. Vandenberghe
出版情報: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6521
2.

国際会議録
国際会議録
2. Litho variations and their impact on the electrical yield of a 32nm node 6T SRAM cell
S. Verhaegen ; S. Cosemans ; M. Dusa ; P. Marchal ; A. Nackaerts
出版情報: Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA.  pp.69250R-1-69250R-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6925