SURFACE CONDITION IN THE PLASMA-CVD OF a-Si:H,F FROM SiF4 AND H2
- 著者名:
Maruyama, A. Shen, D.S. Chu, V. Liu, J.Z. Jaroker, J. Campbell, I. Fauchet, P.M. Wagner, S. - 掲載資料名:
- Chemical perspectives of microelectronic materials : symposium held November 30-December 2, 1988, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 131
- 発行年:
- 1989
- 開始ページ:
- 203
- 終了ページ:
- 208
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990043 [1558990046]
- 言語:
- 英語
- 請求記号:
- M23500/131
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
American Institute of Chemical Engineers |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |