1.

国際会議録
国際会議録
1. Critical Processes for Ultrathin Gate Oxide Integrity
Depas, M. ; Heyns, M.M. ; Nigam, T. ; Kenis, K. ; Sprey, H. ; Wilhelm, R. ; Crossley, A. ; Sofield, C.J. ; Graef, D.
出版情報: The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface.  pp.352-366,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-1
2.

国際会議録
国際会議録
2. IN-SITU MULTIPROCESSING OF ULTRATHIN SILICON NITRIDE CAPACITORS FOR ADVANCED DRAM CELLS
Thakur, R. P. S. ; Hawthorne, R. ; Mathews, V. K. ; Fazan, P. C. ; Werkhoven, C .J. ; Granneman, E. ; Wilhelm, R.
出版情報: Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A..  pp.195-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 342