1.
国際会議録 |
Vogel, E.M. ; Wortman, J.J.
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2.
国際会議録 |
2. Silicon Oxynitride Films formed by Rapid Ther-mal Chemical Vapor Deposition for VLSI Applications
Vogel, E.M. ; Wortman, J.J. ; McLarty, P.K. ; Watt, V.H.C. ; Kirkpatrick, B.
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