Oxide charging induced by electron exposure in ion implant

Oxide charging induced by electron exposure in ion implant

著者名:

Stuber,A. ( Advanced Micro Devices,Inc. )
Lowell,J.K.

掲載資料名:

Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2638

発行年:

1995

開始ページ:

183

終了ページ:

192

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420046 [0819420042]

言語:

英語

請求記号:

P63600/2638

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020725
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Microelectronic Manufacturing : Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing
回次:	1995 : 2nd
会議開催地:	Austin, TX, USA
会議開催年:	1995.10.25-1995.10.26

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