Sofield, C.J. ; Murrell, M.P. ; Sugden, S. ; Heyns, M. ; Verhaverbecke, S. ; Welland, M.E. ; Golan, B. ; Barnes, J.
出版情報:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.105-112, 1992. Pittsburgh, Pa.. Materials Research Society
Depas, M. ; Heyns, M.M. ; Nigam, T. ; Kenis, K. ; Sprey, H. ; Wilhelm, R. ; Crossley, A. ; Sofield, C.J. ; Graef, D.
出版情報:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.352-366, 1996. Pennington, NJ. Electrochemical Society