1.

国際会議録
国際会議録
1. 0.12-ｦﾌm logic process using a 248-nm step-and-scan system
Baker,D.C. ; Zheng,T. ; Takemoto,C.H. ; Sethi,S.S. ; Gabriel,C. ; Scott,G.S.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.294-304,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
2.

国際会議録
国際会議録
2. Effect of stress and dopant redistribution on trench-isolated narrow devices
Scott,G.S. ; Nouri,F. ; Rubin,M.E. ; Manley,M. ; Stolk,P.
出版情報: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.183-190,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4181