Blank Cover Image

Growth of CVD Graphene on Copper by Rapid Thermal Processing

著者名:
W. Kim
J. Riikonen
S. Arpiainen
O. Svensk
C. Li
H. Lipsanen
さらに 1 件
掲載資料名:
Nanocarbon materials and devices : symposium held April 9-13, 2012, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
1451
発行年:
2013
開始ページ:
27
終了ページ:
32
総ページ数:
6
出版情報:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781605114286 [1605114286]
言語:
英語
請求記号:
M23500/1451
資料種別:
国際会議録

類似資料:

1 国際会議録 THE EFFECT OF GRAIN BOUNDARIES AND SUBSTRATE INTERACTIONS WITH HYDROGEN ON THE CVD GROWTH OF DEVICE-QUALITY COPPER

Kaloyeros,A. E., Dettelbatcher, C., Eisenbraun, E. T., Lanford, W. A., Li, H. J., Olowolafe, J. F., Murarka, S., …

Materials Research Society
7 国際会議録 Growth and Characterization of Thin Wet Oxides Grown by Rapid Thermal Processing

Sharangpani, R., Das, J., Tay, S. P., Thakur, R. P. S., Yang, T. C., Saraswat, K. C.

MRS - Materials Research Society
2 国際会議録 A Study on the Solid Phase Reaction and Thermal Stability in the Ni-Sil-x Gex System Using Rapid Thermal Annealing (RTA) Process

Choi, H.-J., Kim, H.-Y., Ko, D.-H., Ku, J.-H., Choi, C.-J., Choi, S., Fujihara, K., Kang, H.K., Yang, M-H., Yang, C.-W.

Electrochemical Society
8 国際会議録 EFFECTIVE INTRINSIC GETTERING OF COPPER DURNG A SUB-QUARTER MICRON CMOS PROCESS

Bae, K-M., Kim, J-R., Hong, Y-K., So, S-I., Lee, S-C., Kim, S-S., Ha, S-W., Koh, C-G., Pyi, S-H., Lee, D-M.

Electrochemical Society
3 国際会議録 High-Quality Ultrathin CVD Si3N4 Gate Dielectrics Fabricated by Rapid Thermal Process

Song, S. C., Luan, H. F., Gardner, M., Fulford, J., Allen, M., Kwong, D. L.

MRS - Materials Research Society
9 国際会議録 EFFECTIVE INTRINSIC GETTERING OF COPPER DURNG A SUB-QUARTER MICRON CMOS PROCESS

Bae, K-M., Kim, J-R., Hong, Y-K., So, S-I., Lee, S-C., Kim, S-S., Ha, S-W., Koh, C-G., Pyi, S-H., Lee, D-M.

Electrochemical Society
4 国際会議録 Rapid Thermal Processing of III-Nitrides

Hong, J., Lee, J. W., Vartuli, C. B., MacKenzie, J. D., Donovan, S. M., Abernathy, C. R., Crockett, R. V., Pearton, S. …

MRS - Materials Research Society
10 国際会議録 New Applications of MetaPULSE in Copper Metallization Process

Liu, H., Wang, S.R., He, L., Zhang, Y., Li, W.H., Wu, J.J., Qian, Y., Li, C.Y., Koh, L.T., Liu, Y.J., Xie, J.

Electrochemical Society
5 国際会議録 LOW TEMPERATURE EPITAXIAL SILICON GROWTH IN A RAPID THERMAL PROCESSOR

McNeill, D. W., Gamble, H. S., Armstrong, B. M.

Materials Research Society
11 国際会議録 Methylamine growth of SiCN films using ECR-CVD

Wen, C-Y., Wu, J-J., Lo, H. J., Chen, L. C., Chen, K. H., Lin, S. T., Yu, Y-C., Wang, C-W., Lin, E-K.

MRS-Materials Research Society
6 国際会議録 An XPS study of silicon oxynitride rapid thermally grown in nitric oxide

Lai, W. H., Li, M. F., Pan, J. S., Liu, R., Chan, L., Chua, T. C.

MRS-Materials Research Society
12 国際会議録 Gate Oxynitride Grown in N2O and Annealed in NO Using Rapid Thermal Processing

Sun, S. C., Chen, C. H., Lou, J. C., Yen, L. W., Lin, C. J.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12