1.

国際会議録
国際会議録
1. Control of organic contamination in CMOS manufacturing
Bugler,J. ; Frickinger,J. ; Zielonka,G. ; Pfitzner,L. ; Ryssel,H. ; Schottler,M.
出版情報: In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK.  pp.82-91,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4406
2.

国際会議録
国際会議録
2. Integrated metrology: an enabler for advanced process control (APC)
Schneider,C. ; Pfitzner,L. ; Ryssel,H.
出版情報: In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK.  pp.118-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4406
3.

国際会議録
国際会議録
3. Vacancy-Nitrogen Complexes in Float-Zone Silicon
Quast,F. ; Pichler,P. ; Ryssel,H. ; Falster,R.
出版情報: High Purity Silicon VI : proceedings of the sixth International Symposium.  pp.156-163,  2000.  Pennington, N.J., Bellingham, Wash..  Electrochemical Society — SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4218
4.

国際会議録
国際会議録
4. Feed-forward control for a lithography/etch sequence
Ochsner,R. ; Tschaftary,T. ; Sommer,S. ; Pfitzner,L. ; Ryssel,H. ; Gerath,H. ; Baier,C. ; Hafner,M.
出版情報: Process Control and Diagnostics.  pp.31-39,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4182