1.

国際会議録
国際会議録
1. Metal contamination issues resulting from new Si processes
Benton, J. L. ; Boone, T. ; Jacobson, D.C. ; Lin, Wen ; Wilk, G.D. ; Krautter, H. W. ; Rosamilia, J.M. ; Rafferty, C.S.
出版情報: Crystalline defects and contamination: their impact and control in device manufacturing III : DECON 2001 : proceedings of the Satellite Symposium to ESSDERC 2001, Nuremberg, Germany.  pp.181-191,  2001.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-29
2.

国際会議録
国際会議録
2. The Application of Solid Source Diffusion in the Vertical Replacement-Gate (VRG) MOSFET
Oh, Sang-Hyun ; Hergenrdther, Jack ; Monroe, Don ; Nigam, T. ; Klemens, F.P. ; Kornblit, A. ; Mansfield, W.M. ; Baumaun, F.H. ; Gossmann, H.J. ; King, C.A. ; Kleiman, R, N. ; Vuong, H.-H. ; Weber, G.R. ; Rafferty, C.S.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B3.2-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610