1.

国際会議録
国際会議録
1. IC COMPATIBLE PROCESSING OF Si:Er FOR OPTOELECTRONICS
Ren, F.Y.G. ; Michel, J. ; Sun-Paduano, Q. ; Zheng, B. ; Kitagawa, H. ; Jacobson, D.C. ; Poate, J.M. ; Kimerling, L.C.
出版情報: Silicon-based optoelectronic materials : Symposium held April 12-14, 1993, San Francisco, California, U.S.A..  pp.415-424,  1993.  Pittsburgh, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 298
2.

国際会議録
国際会議録
2. THE EFFECT OF HYDROGEN ON THE KINETICS OF SOLID PHASE EPITAXY IN AMORPHOUS SILICON
Roth, J.A. ; Olson, G.L. ; Jacobson, D.C. ; Poate, J.M. ; Kirschbaum, C.
出版情報: Kinetics of phase transformations : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A..  pp.45-50,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 205
3.

国際会議録
国際会議録
3. CHANGING SEGREGATION COEFFICIENTS DURING ION BEAM INDUCED EPITAXY OF AMORPHOUS Si
Custer, J.S. ; Thompson, Michael O. ; Jacobson, D.C. ; Poate, J.M.
出版情報: Kinetics of phase transformations : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A..  pp.81-86,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 205
4.

国際会議録
国際会議録
4. EPITAXY AND NUCLEATION IN Cu AND Ag DOPED AMORPHOUS Si
Custer, J.S. ; Thompson, Michael O. ; Eaglesham, D.J. ; Jacobson, D.C. ; Poate, J.M. ; Liefting, J.R. ; Saris, F.W.
出版情報: Kinetics of phase transformations : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A..  pp.69-74,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 205
5.

国際会議録
国際会議録
5. THE ENHANCEMENT OF THE INTERDIFFUSIN IN Si/Ge AMORPHOUS ARTIFICAL MULTILAYERS BY ADDITIONS OF B AND Au
Park, B. ; Spaepen, F. ; Poate, J.M. ; Jacobson, D.C.
出版情報: Impurities, defects, and diffusion in semiconductors : bulk and layered structures : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A..  pp.621-626,  1990.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 163
6.

国際会議録
国際会議録
6. CORRELATION OF ELECTRICAL, STRUCTURAL, AND OPTICAL PROPERTIES OF ERBIUM IN SILICON
Benton, J.L. ; Eaglesham, D.J. ; Almonte, M. ; Citrin, P.R. ; Marcus, M.A. ; Adler, D.L. ; Jacobson, D.C. ; Poate, J.M.
出版情報: Silicon-based optoelectronic materials : Symposium held April 12-14, 1993, San Francisco, California, U.S.A..  pp.447-452,  1993.  Pittsburgh, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 298
7.

国際会議録
国際会議録
7. DIFFUSION OF HYDROGEN IN AMORPHOUS SILICON IN THE LOW CONCENTRATION REGIME
Roth, J.A. ; Olson, G.L. ; Jacobson, D.C. ; Poate, J.M.
出版情報: Amorphous silicon technology, 1993 : Symposium held April 13-16, San Francisco, California, U.S.A..  pp.291-296,  1993.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 297
8.

国際会議録
国際会議録
8. Ion Implantation: The Critical Roles of Defects, Diffusion, and Dopant Profile Control
Jacobson, D.C. ; Poate, J.M.
出版情報: ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology.  pp.297-312,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-3
9.

国際会議録
国際会議録
9. Diffusion of Si Self-Interstitials in the Presence of Carbon-Related Interstitial Traps
Gossman, H.-J. ; Stolk, P.A. ; Eaglehsam, D.J. ; Gilmer, G.H. ; Poate, J.M.
出版情報: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.64-74,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-4
10.

国際会議録
国際会議録
10. The Effect of TiSi2 Film Thickness and Growth on the Point Defect Perturbance in Si
Hemer, S.B. ; Jones, K.S. ; Gossman, H.-J. ; Tung, R.T. ; Poate, J.M. ; Luftman, H.S.
出版情報: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.337-347,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-4