1.

国際会議録
国際会議録
1. THE ROLE OF IMPLANT TEMPERATURE IN THE FORMATION OF THIN BURIED OXIDE LAYERS
White, Alice E. ; Short, K.T. ; Pfeiffer, L.N. ; West, K.W. ; Batstone, J.L.
出版情報: Beam-solid interactions and transient processes : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A..  pp.585-590,  1987.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 74
2.

国際会議録
国際会議録
2. * THERMAL STRESS DURING ZONE-MELTING-RECRYSTALLIZATION OF SILICON ON INSULATOR FILMS: THE ORIGIN OF SUBBOUNDARIES AND IN-PLANE ORIENTATION OF SOI
Gibson, J.M. ; Pfeiffer, L.N. ; West, K.W. ; Joy, D.C.
出版情報: Semiconductor-on-insulator and thin film transistor technology : symposium held December 3-6, 1985, Boston, Massachusetts, U.S.A..  pp.289-300,  1985.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 53