1.

国際会議録
国際会議録
1. Optical proximity strategies for desensitizing lens aberrations
Petersen,J.S.
出版情報: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.254-265,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4404
2.

国際会議録
国際会議録
2. Analytical description of antiscattering and scattering bar assist features
Petersen,J.S.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.77-89,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
3.

国際会議録
国際会議録
3. High-transmission attenuated PSM:benefits and limitations through a validation study of 33%,20%,and 6% transmission masks
Kachwala,N. ; Petersen,J.S. ; McCallum,M.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1163-1174,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
4.

国際会議録
国際会議録
4. Phase phirst! An improved strong-PSM paradigm
Levenson,M.D. ; Petersen,J.S. ; Gerold,D.G. ; Mack,C.A.
出版情報: 20th Annual BACUS Symposium on Photomask Technology.  pp.395-404,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4186
5.

国際会議録
国際会議録
5. Multiple pitch transmission and phase analysis of six types of strong phase-shifting masks
Gerold,D.J. ; Petersen,J.S. ; Levenson,M.D.
出版情報: Optical Microlithography XIV.  4346  pp.729-743,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4346
6.

国際会議録
国際会議録
6. Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
Smith,M.D. ; Mack,C.A. ; Petersen,J.S.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.1013-1021,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345
7.

国際会議録
国際会議録
7. Binary halftone chromeless PSM technology for λ/4 optical lithography
Chen,J.F. ; Petersen,J.S. ; Socha,R.J. ; Laidig,T.L. ; Wampler,K.E. ; Nakagawa,K.H. ; Hughes,G.P. ; MacDonald,S.S. ; Ng,W.
出版情報: Optical Microlithography XIV.  4346  pp.515-533,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4346