1.

国際会議録
国際会議録
1. Defect printability for sub-0.18ｦﾌm design rules using 193-nm lithography process and binary OPC reticle
Phan,K.A. ; Spence,C.A. ; Schefske,J.A. ; Okoroanyanwu,U. ; Levinson,H.J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.773-780,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
2.

国際会議録
国際会議録
2. Process-induced defects in sub-0.15-ｦﾌm device patterning using 193-nm lithography
Okoroanyanwu,U. ; Pike,C. ; Levinson,H.J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.277-283,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
3.

国際会議録
国際会議録
3. Impact of optical absorption on process control for sub-0.15-ｦﾌm device patterning using 193-nm lithography
Okoroanyanwu,U. ; Levinson,H.J. ; Romero,J. ; Singh,B. ; Lee,S.-J.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.781-790,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
4.

国際会議録
国際会議録
4. Defects and metrology of ultrathin resist films
Okoroanyanwu,U. ; Cobb,J.L. ; Dentinger,P.M. ; Henderson,C.C. ; Rao,V. ; Monahan,K.M. ; Luo,D. ; Pike,C.
出版情報: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.515-526,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3998
5.

国際会議録
国際会議録
5. Integration considerations for 130-nm device patterning using ArF lithography
Okoroanyanwu,U. ; Levinson,H.J. ; Yang,C.-Y. ; Pangrle,S.K. ; Schefske,J.A. ; Kent,E.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.423-434,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
6.

国際会議録
国際会議録
6. Issues and nonissues on a 193-nm step-and-scan system in production
Schefske,J.A. ; Kent,E. ; Okoroanyanwu,U. ; Levinson,H.J. ; Masud,C.R. ; Streefkerk,B. ; Hanzen,R. ; Brueback,J.
出版情報: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.460-471,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4000
7.

国際会議録
国際会議録
7. Spectroscopic characterization of acid mobility in chemically amplified resists
Jessop,J.L.P. ; Goldie,S.N. ; Scranton,A.B. ; Blanchard,G.J. ; Rangarajan,B. ; Okoroanyanwu,U. ; Subramanian,R. ; Templeton,M.K.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.161-170,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
8.

国際会議録
国際会議録
8. Manufacturability of the ultrathin resist process
Pike,C. ; Bell,S. ; Plat,M.V. ; King,P. ; Nguyen,K.B. ; Lyons,C.F. ; Levinson,H.J. ; Phan,K.A. ; Okoroanyanwu,U.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.328-333,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997