1.

国際会議録
国際会議録
1. Second harmonic generation in pulsed-laser-deposited nanocrystalline ZnO films
Thareja,R.K. ; Ohshima,T. ; Mitra,A. ; Ikegami,T. ; Ebihara,K.
出版情報: Materials and devices for photonic circuits II : 1-2 August 2001, San Diego, USA.  pp.127-133,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4453
2.

国際会議録
国際会議録
2. Realization of mass prouction for 130-nm node and future application for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography
Ii,T. ; Saga,T. ; Hattori,Y. ; Ohshima,T. ; Otaki,M. ; Iwakata,M. ; Haraguchi,T. ; Kanayama,K. ; Yamazaki,T. ; Fukuhara,N. ; Matsuo,T.
出版情報: 20th Annual BACUS Symposium on Photomask Technology.  pp.297-308,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4186