1.

国際会議録
国際会議録
1. Partially strained Si1-xGex/Si structures investigated by photoreflectance spectroscopy
Sitarek,P. ; Misiewicz,J. ; Nauka,K.
出版情報: Epilayers and heterostructures in optoelectronics and semiconductor technology : International Conference on Solid State Crystals '98 : 12-16 October 1998, Zakopane, Poland.  pp.214-217,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3725
2.

国際会議録
国際会議録
2. Contact potential difference methods for full wafer characterization of Si/Si02 interface defects induced by plasma processing (Invited Paper)
Edelman,P. ; Savchouk,A. ; Wilson,M. ; Jastrzebski,L. ; Lagowski,J.J. ; Nauka,K. ; Ma,S. ; Hoff,A.M. ; DeBusk,D.K.
出版情報: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California.  pp.126-136,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3509