1.

国際会議録
国際会議録
1. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
2.

国際会議録
国際会議録
2. Ion implantation in Ge and associated defect control (invited paper)
Satta, A. ; Simoen, E. ; Janssens, T. ; Benedetti, A. ; Clarysse, T. ; De Jaeger, B. ; Geenen, L. ; Brijs, B. ; Meuris, M. ; Vandervorst, W.
出版情報: Crystalline defects and contamination: their impact and control in device manufacturing IV : DECON 2005 : proceedings of the Satellite Symposium to ESSDERC 2005, Grenoble, France.  pp.52-60,  2005.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-10
3.

国際会議録
国際会議録
3. 56 Dopants for n and p Junctions in Germanium
Satta, A. ; Simoen, E. ; Meuris, M. ; Janssens, T. ; Clarysse, T. ; Demeurisse, C. ; Hoflijk, I. ; Vandervorst, W.
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.468-475,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
4.

国際会議録
国際会議録
4. Characterization of Slurry System and Suppression of Oxide Erosion in Aluminum CMP (Chemical-Mechanical Planarization)
Devriendt, ft. ; Grilaert, J. ; Heylen, N. ; Holl, K. ; Meuris, M. ; Yang, J. ; Zhong, L.
出版情報: Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.115-122,  2000.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 566
5.

国際会議録
国際会議録
5. Modeling the Influence of Pad Bending on the Planarization Performance During CMP
Devriendt, K. ; Fyen, W. ; Grillaert, J. ; Heylen, N. ; Heyns, M. ; Meuris, M. ; Vrancken, E.
出版情報: Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.45-50,  2000.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 566
6.

国際会議録
国際会議録
6. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.163-168,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
7.

国際会議録
国際会議録
7. Oxidation of Glassy and Nanocrystalline Zr70Pd30 Alloys
Jastrow, L. ; Meuris, M. ; Koster, U. ; Froumin, N. ; Eliezer, D.
出版情報: Metastable, mechanically alloyed and nanocrystalline materials : ISMANAM 2001 : proceedings of the International Symposium on Metastable, Mecanically Alloyed and Nanocrystalline Materials, University of Michigan, Ann Arbor, MI, USA, Jun 24-29, 2001.  pp.627-632,  2002.  Zurich-Uetikon, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 386-388