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Characterization of Polysilicon Gate Etch with Ultra Thin Gate Oxide (<35 A゜) in a Decoupled Plasma Source Etcher

著者名:
Lii, T.
Park, E.
Lutz, J.
Wu, W.
Simpson, L.
Mui, D.
さらに 1 件
掲載資料名:
Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-30
発行年:
1997
開始ページ:
79
終了ページ:
84
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771832 [1566771838]
言語:
英語
請求記号:
E23400/97-30
資料種別:
国際会議録

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