Characterization of Polysilicon Gate Etch with Ultra Thin Gate Oxide (<35 A゜) in a Decoupled Plasma Source Etcher
- 著者名:
Lii, T. Park, E. Lutz, J. Wu, W. Simpson, L. Mui, D. - 掲載資料名:
- Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 97-30
- 発行年:
- 1997
- 開始ページ:
- 79
- 終了ページ:
- 84
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771832 [1566771838]
- 言語:
- 英語
- 請求記号:
- E23400/97-30
- 資料種別:
- 国際会議録
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