1.

国際会議録
国際会議録
1. ELECTRON CYCLOTRON RESONANCE PLASMA ETCHING/CLEANING FOR Si DEVICE FABRICATION
Wan, Zhimin ; Yasuda, Tetsuji ; Lucovsky, Gerald ; Lamb, H. Henry
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.225-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
2.

国際会議録
国際会議録
2. Controlled Nitrogen-Atom Incorporation at Si-SiO2 Interfaces in MIS Devices
Lee, David R. ; Parker, Christopher G. ; Hauser, John R. ; Lucovsky, Gerald
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.243-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386