1.

国際会議録
国際会議録
1. Influence of oxygen-iron interaction on the external gettering of Fe in p-Si by polycrystalline silicon film
Mishra,K.K. ; Stinson,M. ; Lowell,J.K.
出版情報: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II.  pp.121-128,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2638
2.

国際会議録
国際会議録
2. Evaluation of contaminant-induced charge from oxide chemical-mechanical polish
Burke,P. ; Lowell,J.K. ; Jastrzebski,L.
出版情報: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II.  pp.27-37,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2638
3.

国際会議録
国際会議録
3. Oxide charging induced by electron exposure in ion implant
Stuber,A. ; Lowell,J.K.
出版情報: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II.  pp.183-192,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2638
4.

国際会議録
国際会議録
4. Optical characterization of surface effects from Cu-contaminated SiO2/Si interfaces
Wang,X. ; Parks,H.G. ; Cariss,C. ; Lowell,J.K.
出版情報: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II.  pp.246-255,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2638