Real-time on-wafer evaluation of contaminant-induced defects from resist processing
- 著者名:
- Lowell,J.K. ( Advanced Micro Devices and Univ.of Texas/Austin )
- Ackmann,P.W.
- Brown,S.E.
- Sherry,J.
- Hossain,T.
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2725
- 発行年:
- 1996
- 開始ページ:
- 206
- 終了ページ:
- 216
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421012 [0819421014]
- 言語:
- 英語
- 請求記号:
- P63600/2725
- 資料種別:
- 国際会議録
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11
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