Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- 著者名:
Lu, Z. G. ( Seimens Microelectronics ) Cui, Y. ( IBM Microelectronics Div. ) Thomas, A. C. ( IBM Microelectronics Div. ) Mansfield, S. M. ( IBM Microelectronics Div. ) Kunkel, G. ( Siemens Microelectronics ) Dobuzinsky, D. ( IBM Microelectronics Div. ) Zach, F. X. ( IBM Microelectronics Div. ) Liu, D. ( Siemens Microelectronics ) Chen, K. -J. R. ( IBM Microelectronics Div. ) Jordhamo, G. ( IBM Microelectronics Div. ) Cutmann, A. ( Siemens Microelectronics ) Farrell, T. R. ( IBM Microelectronics Div. ) - 掲載資料名:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3678
- 発行年:
- 1999
- 開始ページ:
- 923
- 終了ページ:
- 934
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- 言語:
- 英語
- 請求記号:
- P63600/3678-2
- 資料種別:
- 国際会議録
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