Minimization of total overlay errors on product wafers using an advanced optimization scheme

Minimization of total overlay errors on product wafers using an advanced optimization scheme

著者名:

Levinson,H.J. ( Advanced Micro Devices,Inc. )
Preil,M.E.
Lord,P.J.

掲載資料名:

Optical Microlithography X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3051

発行年:

1997

開始ページ:

362

終了ページ:

373

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424655 [081942465X]

言語:

英語

請求記号:

P63600/3051

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016573
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1997 : 10th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1997.03.12-1997.03.14

類似資料:

1 国際会議録 Measurement and analysis of reticle and wafer-level contributions to total CD variation Preil,M.E., Mack,C.A. SPIE-The International Society for Optical Engineering	7 国際会議録 Performance study of new segmented overlay marks for advanced wafer processing Adel, M.E., Allgair, J.A., Benoit, D.C., Ghinovker, M., Kassel, E., Nelson, C., Robinson, J.C., Seligman, G.S. SPIE-The International Society for Optical Engineering
2 国際会議録 Improving the accuracy of overlay measurements through reduction in tool-and wafer-induced shifts Preil,M.E., Plambeck,B.F., Uziel,Y., Zhou,H., Melvin,M.W. SPIE-The International Society for Optical Engineering	8 国際会議録 Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems Hamaker,H.C., Burns,G.A., Buck,P.D. SPIE-The International Society for Optical Engineering
3 国際会議録 Automated method for overlay sample plan optimization based on spatial variation modeling Chen,X., Preil,M.E., Goff-Dussable,M.Le, Maenhoudt,M. SPIE-The International Society for Optical Engineering	9 国際会議録 Lithography: a look at what is ahead Levinson,H.J. SPIE-The International Society for Optical Engineering
4 国際会議録 Overlay accuracy in 0.18-μm copper dual-damascene process Schulz, B., Levinson, H.J., Seltmann, R., Seligson, J.L., Izikson, P., Ronen, A. SPIE-The International Society for Optical Engineering	10 国際会議録 Metrology requirements for lithography's next wave Levinson, H.J. SPIE - The International Society of Optical Engineering
5 国際会議録 Measurement and analysis of reticle and wafer-level contributions to total CD variation Preil,M., Mack,C.A. SPIE-The International Society for Optical Engineering	11 国際会議録 Overlay performance in advanced processes Bornebroek,F., Burghoorn,J., Greeneich,J.S., Megens,H.J., Satriasaputra,D., Simons,G., Stalnaker,S., Koek,B. SPIE - The International Society for Optical Engineering
6 国際会議録 Analysis of focus errors in lithography using phase-shift monitors La Fontaine, B., Dusa, M.V., Krist, J., Acheta, A., Kye, J., Levinson, H.J., Luijten, C., Sager, C.B., Thomas, J., van … SPIE-The International Society for Optical Engineering	12 国際会議録 Development of an autostereoscopic monitor and 2D-to-3D conversion for medical and surgical uses:requirements,clinical trials,and degree of acceptance Levinson,M.E., Hamagishi,G., Murata,H. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12