1.

国際会議録
国際会議録
1. A Self-Aligned Silicide Process Utilizing Ion Implants For Reduced Silicon Consumption And Control Of The Silicide Formation Temperature
Cohen, G.M. ; Cabral, C., Jr. ; Lavoie, C. ; Solomon, P.M. ; Guarini, K.W. ; Chan, K.K. ; Roy, R.A.
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.35-40,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
2.

国際会議録
国際会議録
2. In-situ Studies of Silicide Formation in Ti-Ta Bilayer Thin Films on Poly-Si
Ozcan, A.S. ; Ludwig K.F., Jr. ; Lavoie, C. ; Cabral, C., Jr. ; Harper, J.M.E.
出版情報: Magnetic and electronic films : microstructure, texture and application to data storage : symposium held April 1-4, 2002, San Francisco, California, U.S.A..  pp.43-50,  2002.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 721
3.

国際会議録
国際会議録
3. A Self-Aligned Silicide Process for Thin Silicon-on-Insulator MOSFETs and Bulk MOSFETs With Shallow Junctions
Cohen, G.M. ; Cabral, C., Jr. ; Lavoie, C. ; Solomon, P.M. ; Guarini, K.W. ; Chan, K.K. ; Roy, R.A.
出版情報: Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A..  pp.89-94,  2002.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 686
4.

国際会議録
国際会議録
4. The Growth Of Tantalum Thin Films By Plasma-Enhanced Atomic Layer Deposition And Diffusion Barrier Properties
Kim, H. ; Cabral, C., Jr. ; Lavoie, C. ; Rossnagel, S.M.
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.407-412,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716