1.

国際会議録
国際会議録
1. (4.18) 8:16 - 8:19 PM - Enhancement of SiGe Relaxation for Fabrication of SGOI Substrates Using Condensation
Sadaka, M. ; Thean, A. ; Barr, A. ; White, T. ; Vartanian, V. ; Zavala, M. ; Nguyen, B-Y. ; Xie, Q. ; Liu, R. ; Wang, X-D. ; Kottke, M. ; Zollner, S. (Freescale)
出版情報: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.281-288,  2004.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2004-07
2.

国際会議録
国際会議録
2. Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica
Angyal, M. ; baugh, Ash. ; D, M. ; Demkov, A. ; Filipiak, S. ; Gregory, R. B. ; Kottke, M. ; Liu, R. ; Mclntyre, L. C. ; Werho, D. ; Zollner, S.
出版情報: The optical properties of materials : symposium held November 30-December 2, 1999, Boston, Massachusetts, U.S.A..  pp.255-260,  2000.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 579
3.

国際会議録
国際会議録
3. Theoretical And Experimental Analysis Of The Low Dielectric Constant Of Fluorinated Silica
Demkov, A.A. ; Zollner, S. ; Liu, R. ; Werho, D. ; Kottke, M. ; Gregory, R.B. ; Angyal, M. ; Filipiak, S. ; Adams, G.B.
出版情報: Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A..  pp.D3.8-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 612