1.

国際会議録
国際会議録
1. Characterization, Electrical Properties, and Interface Engineering of Sputtered Ba0.5Sr0.5 TiO3 Thin Films for DRAM Applications
Chu, P. ; Zafar, S. ; Kottke, M. ; Remmel, T. ; Melnick, B. ; Jones, R.E., Jr.
出版情報: Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues, proceedings of the fourth International Symposium and Thin Film Materials for Advanced Packaging Technologies : proceedings of the second International Symposium.  pp.83-90,  1999.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-7
2.

国際会議録
国際会議録
2. TME EFFECTS OF Si ADDITION ON THE PROPERTIES OF AlCu FILMS USED IN MULTILEVEL METAL SYSTEMS
Wilson, S. R. ; Weston D. ; Kottke, M.
出版情報: Advanced metallizations in microelectronics : symposium held April 16-20, 1990, San Francisco, California, U.S.A..  pp.545-548,  1990.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 181
3.

国際会議録
国際会議録
3. Epitaxial growth of AlN on Si substrates with intermediate 3C-SiC as buffer layers
Hong, S. Q. ; Liaw, H. M. ; Linthicum, K. ; Davis, R. F. ; Fejes, P. ; Zollner, S. ; Kottke, M. ; Wilson, S. R.
出版情報: Wide-bandgap semiconductors for high-power, high-frequency, and high temperature applications--1999 : symposium held April 5-8, 1999, San Francisco, California, U.S.A..  pp.407-,  1999.  Warrendale, PA.  MRS-Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 572