1.

国際会議録
国際会議録
1. Optimization of alignment key in electron-beam lithography
Kim,C.-K. ; Hur,C. ; Kim,Y.-S. ; Baik,K.-H.
出版情報: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.528-535,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3676
2.

国際会議録
国際会議録
2. Novel and high-yield fabrication of electroplated 30 microcoils for MEMS and microelectronics
Yoon,J.-B. ; Han,C.-H. ; Yoon,E. ; Kim,C.-K.
出版情報: Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California.  pp.233-240,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3511
3.

国際会議録
国際会議録
3. Uniform and simultaneous fabrication of high-precision and high-density orifice,channel,and reservoirs for ink-jet printheads
Yoon,J.-B. ; Lee,J.-D. ; Han,C.-H. ; Yoon,E. ; Kim,C.-K.
出版情報: Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California.  pp.214-224,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3511
4.

国際会議録
国際会議録
4. Planarization and trench filling on severe surface topography with thick photoresist for MEMS
Yoon,J.-B. ; Oh,G.Y. ; Han,C.-H ; Yoon,E. ; Kim,C.-K.
出版情報: Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California.  pp.297-306,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3511
5.

国際会議録
国際会議録
5. Novel two-step baking process for high-aspect-ratio photolithography with conventional positive thick photoresist
Yoon,J.-B. ; Han,C.-H. ; Kim,C.-K.
出版情報: Materials and Device Characterization in Micromachining.  pp.316-325,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3512
6.

国際会議録
国際会議録
6. Multilevel microstructure fabrication using single-step 3D photolithography and single-step electroplating
Yoon,J.-B. ; Lee,J.-D. ; Han,C.-H. ; Yoon,E. ; Kim,C.-K.
出版情報: Materials and Device Characterization in Micromachining.  pp.358-366,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3512
7.

国際会議録
国際会議録
7. Novel monolithic and multilevel integration of high-precision 3-D microfluidic components
Yoon,J.-B. ; Han,C.-H. ; Yoon,E. ; Kim,C.-K.
出版情報: Microfluidic Devices and Systems.  pp.183-191,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3515