1.

国際会議録
国際会議録
1. Applications of image diagnostics to metrology quality assurance and process control
Allgair, J.A. ; Boksha, V.V. ; Bunday, B.D. ; Diebold, A.C. ; Cole, D.C. ; Davidson, M.P. ; Hutcheson, J.D. ; Gurnell, A.W. ; Joy, D.C. ; McIntosh, J.M. ; Muckenhirn, S.G. ; Pellegrini, J.C. ; Larrabee, R.D. ; Potzick, J.E. ; Vlada, A.E. ; Smith, N.P. ; Starikov, A. ; Sulivan, N.T. ; Wells, O.C.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.251-277,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042
2.

国際会議録
国際会議録
2. Soft electron beam etching for precision TEM sample preparation
Rack, P.D. ; Thesen, A. ; Randolph, S. ; Fowlkes, J.D. ; Joy, D.C.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.943-949,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
3.

国際会議録
国際会議録
3. Simulation of repairing thin-film phase defect in masks for EUV lithography
Ko, Y.-U. ; Joy, D.C. ; Hector, S.D. ; Lu, B.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.293-302,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038