Iwamoto, Y. ; Nomura, H. ; Sugiura, I. ; Tsubaki, J. ; Takahashi, H. ; Ishikawa, K. ; Shinohara, N. ; Okumiya, M. ; Yamada, Y. ; Kamiya, H. ; Uematsu, K.
出版情報:
Silicon nitride ceramics : scientific and technological advances : symposium held November 30-December 3,1992, Boston, Massachusetts, U.S.A.. pp.435-440, 1993. Pittsburgh. Materials Research Society
Seshimo, H. ; Kobayashi, T. ; Ishikawa, K. ; Yamada, T.
出版情報:
Science and technology in catalysis 1998 : proceedings of the Third Tokyo Conference on Advanced Catalytic Science and Technology, Tokyo, July 19-24, 1998. pp.367-, 1999. Tokyo. Elsevier
Mizuno, Y. ; Tanaka, A. ; Tonda, H. ; Takakuwa, Y. ; Takahiro, K. ; Ishikawa, K. ; Takano, T. ; Ikeuch, T. ; Okada, T. ; Yamaguchi, S. ; Homma, T.
出版情報:
High temperature corrosion and materials chemistry : proceedings of the Per Kofstad Memorial Symposium. pp.153-165, 1999. Pennington, New Jersey. Electrochemical Society
Tsuchiya, S. ; Yamada, T. ; Ishikawa, K. ; Sakata, Y. ; Imamura, H.
出版情報:
Acid-base catalysis II : proceedings of the International Symposium on Acid-Base Catalysis II, Sapporo, December 2-4, 1993. pp.467-, 1994. Tokyo. Elsevier
Hatanaka, Y. ; Jayatissa, A. H. ; Ishikawa, K. ; Nakanishi, Y.
出版情報:
Polycrystalline thin films II : structure, properties, and applications : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.. pp.345-, 1996. Pittsburgh, Pa.. MRS - Materials Research Society
Ishikawa, K. ; Ogawa, H. ; Inomata, C. ; Fujimura, S. ; Mori, H.
出版情報:
Interface control of electrical, chemical, and mechanical properties : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A.. pp.425-, 1994. Pittsburgh. MRS - Materials Research Society
High-Temperature ordered intermetallic alloys VI : symposium held November 28-December 1, 1994, Boston, Massachusetts, U.S.A.. pp.837-, 1995. Pittsburgh, Pa.. MRS - Materials Research Society
Ogawa, H. ; Ishikawa, K. ; Aoki, M. ; Fujimura, S. ; Ueno, N. ; Horiike, Y. ; Harada, Y.
出版情報:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.428-437, 1996. Pennington, NJ. Electrochemical Society