1.

国際会議録
国際会議録
1. CLEANING PROCEDURES FOR UHV CLUSTER-TOOL MOS FABRICATION
Sofield, C.J. ; Murrell, M.P. ; Sugden, S. ; Heyns, M. ; Verhaverbecke, S. ; Welland, M.E. ; Golan, B. ; Barnes, J.
出版情報: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.105-112,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 259
2.

国際会議録
国際会議録
2. SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES
Verhaverbeke, S. ; Alay, J. ; Mertens, P. ; Meuris, M. ; Heyns, M. ; Vandervorst, W. ; Murrell, M. ; Sofield, C.
出版情報: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.391-398,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 259
3.

国際会議録
国際会議録
3. Influence of the Height Difference between the First and Second Nitride Layer on Erosion and Dishing in the Dual Nitride Approach for Shallow Trench Isolation
Heylen, N. ; Grillaert, J. ; Vrancken, E ; Badenes, G. ; Rooyackers, R. ; Meuris, M. ; Heyns, M.
出版情報: Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing.  pp.26-36,  1998.  Pennington, N. J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-7
4.

国際会議録
国際会議録
4. CORROSION OF ALUMINUM ALLOYS DURING DRYING OF METALLIZED WAFERS
Vos, R. ; Meuris, M. ; Mertens, P. ; Heyns, M. ; Hatcher, Z.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.569-578,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
5.

国際会議録
国際会議録
5. Effect of Substrate Defects on GOI of Ultra-Thin Gate Oxides
Bearda, T.R. ; Vanhellemont, J. ; Mertens, P.W. ; Heyns, M.
出版情報: Proceedings of the Fifth International Symposium on High Purity Silicon V.  pp.258-263,  1998.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-13
6.

国際会議録
国際会議録
6. A HF VAPOUR ETCH PROCESS FOR INTEGRATION IN CLUSTER-TOOL PROCESSES: CHARACTERISTICS AND APPLICATIONS
Vermeulen, W.J.C. ; Kwakman, L.F.Tz. ; Werkhoven, C.J. ; Granneman, E.H.A. ; Verhaverbeke, S. ; Heyns, M.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.241-252,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
7.

国際会議録
国際会議録
7. IN-LINE MONITORING OF HF-LAST CLEANING OF IMPLANTED AND NON-IMPLANTED SILICON SURFACES BY NON-CONTACT SURFACE CHARGE MEASUREMENTS
Kondoh, E. ; Trauwaert, M.-A. ; Heyns, M. ; Maex, K.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.221-228,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
8.

国際会議録
国際会議録
8. QUANTITATIVE MODELING OF H2O2 DECOMPOSITION IN SC1
Mertens, P. ; Baeyens, M. ; Moyaerts, G. ; Okorn-Schmidt, H. ; Vos, R. ; De Waele, R. ; Hatcher, Z. ; Hub, W. ; De Gendt, S. ; Knotter, M. ; Meuris, M. ; Heyns, M.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.176-183,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
9.

国際会議録
国際会議録
9. Gas Stream Analysis and PFC Recovery in a Semiconductor Process
Hoeymissen, J. A. B. Van ; Daniels, M. ; Anderson, N. ; Fyen, W. ; Heyns, M.
出版情報: Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A..  pp.55-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 447
10.

国際会議録
国際会議録
10. Chlorine Precursors for Gate Oxidation Processes
McGeary, M. J. ; Martens, P. W. ; Vermeire, B. ; Heyns, M. ; Sprey, H. ; Lubbers, A. ; Schaekers, M.
出版情報: Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A..  pp.115-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 447