1.

国際会議録
国際会議録
1. THE ROLE OF MEGASONIC ENERGY IN PARTICULATE REMOVAL FROM SILICON SUBSTRATES IN DILUTE SC1 CHEMISTRY
Kashkoush, I. ; Brause, E. ; Grant, R. ; Novak, R.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.168-175,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
2.

国際会議録
国際会議録
2. Selective Remote Plasma Etching of Si3N4 Over SIO2 at Elevated Temperature
Staffa, J. ; Luther, B. ; Hwang, D. ; Ruzyllo, J. ; Grant, R. ; March, D.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.283-289,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5
3.

国際会議録
国際会議録
3. Conditioning of Silicon Surface After RIE Using O2 and NF3 Remote Plasma
Hwang, D.K. ; Ruzyllo, J. ; Grant, R.
出版情報: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.230-235,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-5