Energy and Angular Distribution of Ions Extracted from a Large Hole in Contact with a High Density Plasma

Energy and Angular Distribution of Ions Extracted from a Large Hole in Contact with a High Density Plasma

著者名:

掲載資料名:

Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-13

発行年:

2001

開始ページ:

405

終了ページ:

414

総ページ数:

10

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773195 [1566773199]

言語:

英語

請求記号:

E23400/200113

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014016
シリーズID:	PA00000028
会議名:	Fundamental Gas-Phase and Surface Chemistry of Vaper-Phase Materials Synthesis ; Symposium on Process Control, Diagnostics and Modeling in Semiconductor Manufacturing
回次:	2nd ; 4th
会議開催地:	Washington, D.C., USA
会議開催年:	2001.00.00

類似資料:

1 国際会議録 Modeling Potential Distribution Transport and Reaction in Gas Plasmas Economou, D.J. Electrochemical Society	7 国際会議録 Caracteristics of TiN Coating Films for Large Sizes Prepared by Arc Ion Plating K.C. Baek, C.Y. Seo, K.B. Heo, Y.S. Kim, D.J. Yoon Trans Tech Publications
2 国際会議録 High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow Joo, H.S., Seo, D.C., Kim, C.M., Lim, Y.T., Cho, S.D., Lee, J.B., Song, J.Y., Kim, K.M., Park, J.H., Jung, J.C., Shin, … SPIE - The International Society of Optical Engineering	8 国際会議録 New shrinkage technology for nano-contact hole formation Oh, S. K., Kim, J. Y., Jung, Y. H., Lee, J. W., Kim, D. B., Kim, J., Lee, G. S., Lee, S. K., Ban, K. D., Jung, J. C., … SPIE - The International Society of Optical Engineering
3 国際会議録 Modeling and Simulation of Inductively Coupled High Density Plasma Sources Economou, D., Lymberopoulos, D. Electrochemical Society	9 国際会議録 HIGH ENERGY IMPLANTATION OF BORON: REDUCTION OF THREADING DISLOCATION DENSITY IN THE BAD DOSE REGION Bourdelle, K.K., Eaglesham, D.J., Jacobson, D.C., Agarwal, A. Electrochemical Society
4 国際会議録 High energy and low jitter picosecond optical pulser for sample-and-hold Sun, C.K., Chang, C.T., Massey, G.A., Lee, T.Y., Yu, R., Albares, D.J. SPIE	10 国際会議録 High-resolution large-area high-energy x-ray tomography Trebes,J.E., Dolan,K.W., Haddad,W.S., Haskins,J.J., Lerche,R.A., Logan,C.M., Perkins,D.E., Schneberk,D.J., Rikard,R.D. SPIE-The International Society for Optical Engineering
5 国際会議録 Influence of Substrate Placement on Plasma-Assisted Chemical Vapor Deposition of Diamond Koemtzopoulos, C.R., Economou, D.J., Pollard, R. American Institute of Chemical Engineers	11 国際会議録 Etching of Vias and Trenches through Low-k Dielectrics with Feature Sizes down to 0.1 um Using MORI High Density Plasmas Thomas, D.J., Song, Y.P., Powell, K., Fragos, C., Watson, A. Electrochemical Society
6 国際会議録 Parametric Study of Plasma Uniformity in a Dome-Shaped Inductively Coupled Plasma Reactor Economou, D.J., Feldsien, J. Electrochemical Society	12 国際会議録 REMOVAL OF POLYMERIC/SILICATE RESIDUES AND REDUCTION OF CONTACT RESISTANCE FOR INTER-METAL VIA HOLES BY VAPOR PHASE HF CLEANING Tong, J.K., Martin, J.S., Rogers, T.C., Syverson, D.J. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12