1.

国際会議録
国際会議録
1. Si3N4 PARTICLE REMOVAL EFFICIENCY STUDIES
Liu, J.Q. ; Lee, C. ; Rosamilia, J.M. ; Boone, T. ; Higashi, G.S.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.552-559,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
2.

国際会議録
国際会議録
2. The Influence of HF, 0H, and Dissolved 02 on Silicon Surface Chemical Cleaning
Higashi, G.S. ; Chabal, Y.J. ; Raghavachari, K. ; Becker, R.S. ; Green, M.P. ; Hanson, K. ; Boone, T. ; Eisenberg, J.H. ; Shive, S.F. ; DiBello, G.N. ; Fulford, K.L.
出版情報: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993.  pp.189-198,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-13
3.

国際会議録
国際会議録
3. THE EFFECT OF DILUTE CLEANING AND RINSING CHEMISTRIES ON TRANSITION METAL REMOVAL AND Si SURFACE MICROROUGHNESS
Chang, J.P. ; Sapjeta, J. ; Rosamilia, J.M. ; Boone, T. ; Eng, J., Jr. ; Opila, R.L. ; Brennan, S. ; Wiemer, C. ; Pianetta, P.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.17-24,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
4.

国際会議録
国際会議録
4. *INTERFACIAL MICROSTRUCTURE AND CARRIER CONDUCTION PROCESS IN Pt/Ti OHMIC CONTACT TO p-In0.53Ga0.47As FORMED BY RAPID THERMAL PROCESSING
Chu, S. N. G. ; Katz, A. ; Boone, T. ; Thomas, P. M. ; Riggs, V. G. ; Dautremont-Smith, W. C. ; Johnson Jr., W. D.
出版情報: Advanced metallizations in microelectronics : symposium held April 16-20, 1990, San Francisco, California, U.S.A..  pp.389-400,  1990.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 181
5.

国際会議録
国際会議録
5. MEASURING VACANCY DIFFUSIVITY AND VACANCY ASSISTED CLUSTERING BY NITRIDATION ENHANCED DIFFUSION OF Sb IN Si(100) DOPING SUPERLATTICES
Mogi, Toshiharu K. ; Gossmann, H.-J. ; Rafferty, C. S. ; Luftman, H. S. ; Unterwald, F. C. ; Boone, T. ; Thompson, Michael O. ; Poate, J. M.
出版情報: Evolution of thin film and surface structure and morphology : symposium held November 28-December 2, 1994, Boston, Massachusetts, USA.  pp.157-,  1995.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 355
6.

国際会議録
国際会議録
6. A COMPARISON OF THE ROUGHNESS OF VARIOUS Si/SiO2 INTERFACES USING SYNCHROTRON X-RAY DIFFRACTION
Tang, Mau-Tsu ; Evans-Lutterodt, K. W. ; Higashi, G. S. ; Boone, T.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.399-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
7.

国際会議録
国際会議録
7. Hot Water Etching of Silicon Surfaces: New Insights of Mechanistic Understanding and Implications to Device Fabrication
Rosamilia, J. M. ; Boone, T. ; Sapjeta, J. ; Raghavachari, K. ; Higashi, G. S. ; Liu, Q.
出版情報: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.181-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 477
8.

国際会議録
国際会議録
8. HF-IMMERSION INDUCTIVELY COUPLED CARRIER LIFETIME CHARACTERIZATION OF FURNACE-OXIDE GROWTH
Boone, T. ; Higashi, G. S. ; Benton, J. L. ; Kistler, R. C. ; Weber, G. R. ; Keller, R. C. ; Makris, G.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.359-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
9.

国際会議録
国際会議録
9. ION IMPLANTED CALIBRATION STANDARDS FOR Si SURFACE CONTAMINATION DETECTION BY TXRF
Jacobson, D. C. ; Poate, J. M. ; Higashi, G. S. ; Boone, T. ; Eaglesham, D. J. ; Hockett, Richard
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.347-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
10.

国際会議録
国際会議録
10. DETECTION OF PROCESS INDUCED DISLOCATIONS IN SILICON
Benton, J.L. ; Higashi, G.S. ; Boone, T.
出版情報: Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology.  pp.1117-1122,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-10