CHARACTERIZATION OF SILICON-GATE CMOS/SOS INTEGRATED CIRCUITS PROCESSED WITH ION IMPLANTATION | 東京工業大学附属図書館文献データベース

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CHARACTERIZATION OF SILICON-GATE CMOS/SOS INTEGRATED CIRCUITS PROCESSED WITH ION IMPLANTATION

著者名:: Woo, D. S. ( RCA Corporation )
掲載資料名:: NASA Technical Reports
発行年:: 1982
号:: NASA-CR-161988
通号:: G3/33 19720
パート:: NAS 1.26:161988
ペーパー番号:: N84-29087
開始ページ:: 1
終了ページ:: 18
総ページ数:: 18
出版情報:: National Aeronautics and Space Administration
言語:: 英語
資料種別:: テクニカルペーパー

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TDL書誌ID:

ZA00002949

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