Electrical Stability Impact of Gate Oxide in Channel Implanted SiC NMOS and PMOS Transistors
- 著者名:
M.I. Idris M.H. Weng H.K. Chan A.E. Murphy D.A. Smith R.A.R. Young E.P. Ramsay D.T. Clark N.G. Wright A.B. Horsfall - 掲載資料名:
- Silicon Carbide and Related Materials 2016
- シリーズ名:
- Materials science forum
- シリーズ巻号:
- 897
- 発行年:
- 2017
- 開始ページ:
- 513
- 終了ページ:
- 516
- 総ページ数:
- 4
- 出版情報:
- Aedermannsdorf, Switzerland: Trans Tech Publications
- ISSN:
- 02555476
- ISBN:
- 9783035710434 [3035710430]
- 言語:
- 英語
- 請求記号:
- M23650
- 資料種別:
- 国際会議録
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