Optimization of a 193-nm silylation process for sub-0.25-µm lithography

Optimization of a 193-nm silylation process for sub-0.25-µm lithography

著者名:

掲載資料名:

Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2438

発行年:

1995

パート:

1

開始ページ:

455

終了ページ:

464

総ページ数:

10

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417862 [0819417866]

言語:

英語

請求記号:

P63600/2438

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057641
シリーズID:	PA00000029
会議名:	Symposium on advances in resist technology and processing
回次:	12th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1995.02.20-1995.02.22
論文注記:	12th Symposium on advances in resist technology and processing, February 20-22, 1995, Santa Clara, CA, USA. 2438-22

類似資料:

1 国際会議録 193-nm lithography Rothschild,M., Forte,A.R., Horn,M.W., Kunz,R.R., Palmateer,S.C., Sedlacek,J.H.C. SPIE-The International Society for Optical Engineering	7 国際会議録 Damage testing of pellicles for 193-nm lithography Liberman,V., Kunz,R.R., Rothschild,M., Sedlacek,J.H.C., Uttaro,R.S., Grenville,A., Bates,A.K., Van,Peski,C.K. SPIE-The International Society for Optical Engineering
2 国際会議録 Top-Surface Imaged Resists for 193-nm Lithography Kunz, Roderick R., Palmateer, Susan C., Horn, Mark W., Forte, Anthony R., Rothschild, Mordechai American Chemical Society	8 国際会議録 Performance of excimer lasers as light sources for 193-nm lithography Sedlacek,J.H.C., Doran,S.P., Fritze,M., Kunz,R.R., Rothschild,M., Uttaro,R.S., Corliss,D.A. SPIE-The International Society for Optical Engineering
3 国際会議録 Limits to etch resistance for 193-nm single-layer resists Kunz,R.R., Palmateer,S.C., Forte,A.R., Allen,R.D., Wallraff,G.M., DiPietro,R.A., Hofer,D.C. SPIE-The International Society for Optical Engineering	9 国際会議録 Sub-0.25-pm 50-W amplified excimer laser system for 193-nm lithography Govorkov, S.V., Wiessner, A.O., Hua, G., Misuryaev, T.V., Knysh, A.N., Spratte, S., Lokai, P., Nagy, T., Bragin, I., … SPIE - The International Society of Optical Engineering
4 国際会議録 All-dry resist processes for 193-nm lithography M.W. Horn, B.E. Maxwell, R.R. Kunz, M.S. Hibbs, L.M. Eriksen Society of Photo-optical Instrumentation Engineers	10 国際会議録 High-sensitivity silylation process for 193-nm lithography Mori,S., Kuhara,K., Ohfuji,T., Sasago,M. SPIE-The International Society for Optical Engineering
5 国際会議録 Line-edge roughness in sub-0.18-ｦﾌm resist patterns Palmateer,S.C., Cann,S.G., Curtin,J.E., Doran,S.P., Eriksen,L.M., Forte,A.R., Kunz,R.R., Lyszczarz,T.M., Stern,M.B., … SPIE-The International Society for Optical Engineering	11 国際会議録 Optimizing 0.25-µm lithography using confocal microscopy R.E. Colgan, H.M. Marchman Society of Photo-optical Instrumentation Engineers
6 国際会議録 Marathon damage testing of pellicles for 193-nm lithography Grenville,A., Liberman,V., Kunz,R.R., Rothschild,M., Sedlacek,J.H.C., Uttaro,R.S. SPIE-The International Society for Optical Engineering	12 国際会議録 Process optimization of a positive-tone chemically amplified resist for 0.25-µm lithography using a vector scan e-beam tool A.D. Katnani, D. Schepis, R.W. Kwong, W. Huang, Z.C.H. Tan Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12