Preliminary methodology investigation of mask pattern fidelity for 250-nm design rules
- 著者名:
- 掲載資料名:
- Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2512
- 発行年:
- 1995
- 開始ページ:
- 523
- 終了ページ:
- 536
- 総ページ数:
- 14
- 出版情報:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819418708 [0819418706]
- 言語:
- 英語
- 請求記号:
- P63600/2512
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
国際会議録
180-nm mask fabrication process using ZEP 7000,multipass gray,GHOST,and dry etch for MEBES 5000
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |