Antireflection coating process characterization and improvement for DUV lithography at 0.25 µm: ground rules

Antireflection coating process characterization and improvement for DUV lithography at 0.25 µm: ground rules

著者名:

掲載資料名:

Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2440

発行年:

1995

開始ページ:

582

終了ページ:

593

総ページ数:

12

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417886 [0819417882]

言語:

英語

請求記号:

P63600/2440

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057643
シリーズID:	PA00000029
会議名:	Symposium on optical/laser microlithography
回次:	8th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1995.02.22-1995.02.24
論文注記:	8th Symposium on optical/laser microlithography, February 22-24, 1995, Santa Clara, CA, USA. 2440-52

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