Simulation study of a new phase-shifting mask: halftone-rim
- 著者名:
- 掲載資料名:
- Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2440
- 発行年:
- 1995
- 開始ページ:
- 448
- 終了ページ:
- 457
- 総ページ数:
- 10
- 出版情報:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819417886 [0819417882]
- 言語:
- 英語
- 請求記号:
- P63600/2440
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
7
国際会議録
Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |