Blank Cover Image

Advanced statistical process control of a chemical vapor tungsten deposition process on an Applied Materials Centura reactor

著者名:
掲載資料名:
Manufacturing process control for microelectronic devices and circuits : 20-21 October 1994, Austin, Texas
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2336
発行年:
1994
開始ページ:
25
終了ページ:
36
総ページ数:
12
出版情報:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819416698 [081941669X]
言語:
英語
請求記号:
P63600/2336
資料種別:
国際会議録

類似資料:

1 国際会議録 Methods for the design of microelectronic devices and process flows for manufacturability

Saxena,S., Burch,R., Mozumder,P.K., Vasanth,K., Rao,S., Davis,J., Fernando,C.

SPIE-The International Society for Optical Engineering
7 国際会議録 Processing of Tungsten Single Crystals by Chemical Vapor Deposition

Zee, R., Xiao, Z., Gale, H.S., Chin, B.A., Begg, L.L.

Electrochemical Society
2 国際会議録 Global Model of Silicon Chemical Vapor Deposition in Centura Reactors

Segal, A.S., Kondratyev, A.V., Galyskov, A.O., Kampov, S.Yu., Makarov, Yu.N., Sieberm, W., Siarek, P., Lowmy, S.

Electrochemical Society
8 国際会議録 Characterization of tungsten silicide(WSix)film grown by chemical vapor deposition(CVD)

Hossain,F.R., Ambadi,S., Winer,R., Kitt,K., Garcia,C., Pearse,J.

SPIE - The International Society for Optical Engineering
3 国際会議録 A Study of Transistor Optimization in a 0.25 Micron CMOS Flow Using Source/Drain and Silicide Process Modules and Their Interactions

Vasanth, K., Apte, P., Davis, J., Saxena, S., Burch, R., Rao, S., Mozumder, P. K.

MRS - Materials Research Society
9 国際会議録 IN SITU CONTAMINATION CONTROL INVESTIGATION OF SILICON NITRIDE LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS IN VERTICAL THERMAL REACTORS

Moinpour, Mansour, Bohannan, K., Shenasa, M., Sharif, A., Guzzo, G., Brestovansky, D.F., Markle, R.J., Wilkes, R.

Materials Research Society
4 国際会議録 A Study of Transistor Optimization in a 0.25 Micron CMOS Flow Using S/D and Silicide Process Modules and Their Interactions

Vasanth, K., Apte, P., Davis, J., Saxena, S., Burch, R., Rao, S., Mozumder, P. K.

MRS - Materials Research Society
10 国際会議録 DEPOSITION OF OXIDE BASED ADVANCED ELECTRONIC AND OPTICAL MATERIALS BY RAPID ISOTHERMAL PROCESSING (RIP) ASSISTED METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD)

Mavoori, J., Singh, R., Sharangpani, R., Gong, C., Poole, K. F., Singh, R. K., Natarajan, R.

MRS - Materials Research Society
5 国際会議録 Programmed Rate and Optimal-Control Chemical Vapor Deposition of Tungsten

Kristof, J., Song, L., Tsakalis, K., Cale, T.S.

Electrochemical Society
11 国際会議録 Tribological Experiments Applied to Tungsten Chemical- Mechanical Polishing

Agarwal, P., Bielmann, M., Lolt, D., Mahajan, U., Mischler, S., Rosset, E., Singh, R. K.

Materials Research Society
6 国際会議録 Run By Run Advanced Process Control of Metal Sputter Deposition

Smith, T.H., Boning, D.S., Stefani, J., Butler, S.W.

Electrochemical Society
12 国際会議録 Impact of Rapid Thermal Annealing of Ti-TiN Bilayers on Subsequent Chemical Vapor Deposition of Tungsten

Mouroux, A., Palmans, R., Keinonen, J., Zhang, S.-L., Maex, K., Petersson, C. S.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12